E05410 - SEMI E54.10 - Specification for Sensor/Actuator Network Specific Device Model for an In-Situ Particle Monitor Device Revision:SEMI E54.10-0600 (Reapproved 1111) - Superseded SEMI E69-0298 (Reapproved 0309)

SEMI E69-0298 (Reapproved 0309)

subsystems

本仕様は，半導体パワー用デバイス／IC製造用のシリコン・オン・インシュレーター（SOI）ウェーハに関する要求条件を規定している。試験方法と受入基準を定義することによって，ユーザとサプライヤの両者は製品の特性と品質に関する要求条件を明確にすることができる。

previously published June 2000

SEMI M15 — Polished Wafer Defect Limits Table for Polished Gallium Arsenide Wafers

E05410 - SEMI E54.10 - Specification for Sensor/Actuator Network Specific Device Model for an In-Situ Particle Monitor Device Revision:SEMI E54.10-0600 (Reapproved 1111) - Superseded SEMI E69-0298 (Reapproved 0309)An in situ particle monitor (ISPM) is a device that measures and counts particles. These devices classify by size and count, particles in the environment (gaseous, liquid, or vacuum) utilizing a technique such as detecting light from a sample region of the environments space. These counts are accumulated in bins and then reported. The number of bins varies by vendor and model. This Specification specifically addresses the minimum attributes, services,